Toppan Photomask has confirmed a five year agreement with IBM to develop a 2 nanometer logic semiconductor node using extreme ultraviolet (EUV) lithography.
/PRNewswire/ Toppan Photomask, the world s premier semiconductor photomask provider, announced that it has entered into a joint research and development.
University at Albany scientist Scott Tenenbaum, founder of UAlbany spinoff company sxRNA Technologies, Inc. (sxRNA Tech), has received $500,000 from the Nationa
University at Albany scientist Scott Tenenbaum, founder of UAlbany spinoff company sxRNA Technologies, Inc. (sxRNA Tech), has received $500,000 from the Nationa