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Intel completes assembly of first commercial High-NA EUV chipmaking tool — addresses cost concerns, preps for 1 4nm process development in 2025

Intel Foundry announced it had completed the assembly of the industry s first commercial High Numerical Aperture (High-NA) Extreme Ultraviolet (EUV) machine in its D1X fab in Oregon.

United statesNoord brabantSan diegoCentura sculptaPat gelsingerMark phillipsIntel foundryHigh numerical apertureExtreme ultravioletLithography hardwareFirst lightIntel fellowApplied material centura sculptaPowervia backside powerDirected self assemblyOptical proximity correction

SEIDA s Ambitious Quest: Breaking Through US Chip Restrictions with Advanced OPC Technology

In the ongoing technological competition between the United States and China, the quest for dominance in chip technology has become a central focus.

United statesSouth koreaLiguo recoo zhangPeilun allen changJoe bidenSemiconductor manufacturing international corpInno floresTech timesGetty imagesSilicon valleyOptical proximity correctionChief operating officerChina chipCold warUs chip restrictionsPtical proximity correction opc

Nvidia s New Software Will Help Chipmakers Produce Even More Powerful AI

The AI revolution is beginning to feed itself.

Jensen huangGordon moorePeter wenninkTaiwan semiconductor manufacturingOptical proximity correction

NVIDIA s CuLitho to Speed Up Computational Lithography for 2nm and Beyond

NVIDIA s CuLitho to Speed Up Computational Lithography for 2nm and Beyond
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Lithography technologyResolution enhancement technologyInverse lithography technologyOptical proximity correctionSource mask optimization

Nvidia Tackles Chipmaking Process, Claims 40X Speed Up with cuLitho

Nvidia introduced its new cuLitho technology that speeds up a critical chipmaking bottleneck.

Hopper gpusLithography technologyInverse lithography technologyInverse curvilinear masksOptical proximity correction

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