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Intel completes assembly of first commercial High-NA EUV chipmaking tool — addresses cost concerns, preps for 1 4nm process development in 2025
Intel Foundry announced it had completed the assembly of the industry s first commercial High Numerical Aperture (High-NA) Extreme Ultraviolet (EUV) machine in its D1X fab in Oregon.
United states
Noord brabant
San diego
Centura sculpta
Pat gelsinger
Mark phillips
Intel foundry
High numerical aperture
Extreme ultraviolet
Lithography hardware
First light
Intel fellow
Applied material centura sculpta
Powervia backside power
Directed self assembly
Optical proximity correction
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