Advanced Energy Launches MAXstream RPS Product Line for Chamber Clean Applications
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DENVER, COLORADO, Dec. 18 (Korea Bizwire) – Advanced Energy (Nasdaq: AEIS) – a global leader in highly engineered, precision power conversion, measurement, and control solutions – today announced the launch of its new MAXstreamTM remote plasma source (RPS) product line for plasma cleaning of process chambers used in semiconductor device manufacturing. With offerings available across a broad operating range, the MAXstream line delivers higher power accuracy, best-in-class plasma ignition and increased reliability, making it the most capable RPS solution in the market.
“When customers invited AE to step in and help meet the industry’s need for a high performance and reliable RPS, we made it happen,” said Advanced Energy Vice President and General Manager, Semiconductor Products, Peter Gillespie. “Not only does the new MAXstream product line provide a cost-effective and reliabl
Advanced Energy Launches MAXstream RPS Product Line For Chamber Clean Applications Media OutReach
2020-12-18
Extending AE’s leadership in process power, this new line of Remote Plasma Sources delivers reliable performance at a broad range of flow rates, increasing productivity in semiconductor process equipment
DENVER, COLORADO - Media OutReach - 18 December 2020 - Advanced
Energy (Nasdaq: AEIS) a
global leader in highly engineered, precision power conversion, measurement,
and control solutions today announced the launch of its
new MAXstream
TM remote plasma source (RPS) product line for plasma
cleaning of process chambers used in semiconductor device manufacturing. With offerings
2020/12/18 09:30
Extending AE’s leadership in process power, this new line of Remote Plasma Sources delivers reliable performance at a broad range of flow rates, increasing productivity in semiconductor process equipment DENVER, COLORADO - Media OutReach - 18 December 2020 - Advanced
Energy (Nasdaq: AEIS) a
global leader in highly engineered, precision power conversion, measurement,
and control solutions today announced the launch of its
new MAXstream
TM remote plasma source (RPS) product line for plasma
cleaning of process chambers used in semiconductor device manufacturing. With offerings
available across a broad operating range, the MAXstream line delivers higher
power accuracy, best-in-class plasma ignition and increased reliability, making
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