2020/12/18 09:30
Extending AE’s leadership in process power, this new line of Remote Plasma Sources delivers reliable performance at a broad range of flow rates, increasing productivity in semiconductor process equipment
DENVER, COLORADO - Media OutReach - 18 December 2020 - Advanced
Energy (Nasdaq: AEIS) -- a
global leader in highly engineered, precision power conversion, measurement,
and control solutions -- today announced the launch of its
new MAXstream
TM remote plasma source (RPS) product line for plasma
cleaning of process chambers used in semiconductor device manufacturing. With offerings
available across a broad operating range, the MAXstream line delivers higher
power accuracy, best-in-class plasma ignition and increased reliability, making