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New 4-Inch Plasma Etching Technology Opens Door to Mass Production of Next-Generation 2D Semiconductors

A large-scale (4-inch), highly uniform, and defect-free plasma etching technology, which will likely become the foundation of the industrial supply of molybdenum disulfide (MoS2), a next-generation two-dimensional (2D) semiconductor, has been developed. ....

South Korea , Muyoung Kim , Laura Thomsonjun , Changmin Kim , Taesung Kim , Ministry Of Science , Samsung Electronics , Sungkyunkwan University , Development Of Core Technology For Semiconductor , Korea Institute Of Machinery , Hyeongu Kim , Senior Researcher , Plasma Engineering , Korea Institute , President Sang Jin Park , Professor Taesung Kim , Chairman Ji Beom Yoo , Senior Researcher Muyoung Kim , Post Doctoral Researcher Changmin Kim , Automation Industry Focus , Researcher Hyeongu Kim , Core Technology , Semiconductor Display Manufacturing Plasma ,

Large-scale plasma etching technology for mass production of next-generation 2D semiconductors

Large-scale plasma etching technology for mass production of next-generation 2D semiconductors
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South Korea , Taesung Kim , Changmin Kim , Muyoung Kim , Sungkyunkwan University , Samsung Electronics , Korea Institute Of Machinery , Korea Institute , Hyeongu Kim , Senior Researcher , Plasma Engineering , Professor Taesung Kim , Researcher Hyeongu Kim ,