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Detoxifying exhaust gas from device production processes


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IMAGE: New abatement device developed in this study.
In the abatement device developed in this study, Low explosion limit of flammable gas in the piping is raised by reducing the.
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Credit: Kanken Techno Co.,Ltd
Manufacturing process for industries of electronics, such as semiconductors, flat panel displays, and solar batteries uses dangerous toxic and flammable gases, such as silane gas and hydrogen gas. Currently, to detoxify these dangerous gases, a thermal oxidation reaction, in which they are heated to 1000? or more and decomposed is mainly used. For example, as silane gas, which is often used in the chemical vapor disposition (CVD) (1) process for semiconductors, causes an explosive reaction when it comes into contact with the air, after diluting the concentration with large amounts of nitrogen gas so that the concentration is below the lower explosion limit (2), it can be heat-treated and detoxified. Previously, the developm ....

Takanori Ichiki , School Of Engineering , Kanken Techno Co , University Of Tokyo , Seamless Technology Transfer Program , Kanken Techno , Professor Takanori Ichiki , Graduate School , Chemical Vapor Deposition , Lower Explosion Limit , Atmospheric Chemistry , Biomedical Environmental Chemical Engineering , Pollution Remediation , Chemistry Physics Materials Sciences , Industrial Engineering Chemistry , Electrical Engineering Electronics , Climate Change , பள்ளி ஆஃப் பொறியியல் , பல்கலைக்கழகம் ஆஃப் டோக்கியோ , தடையற்ற தொழில்நுட்பம் பரிமாற்றம் ப்ரோக்ர்யாம் , பட்டதாரி பள்ளி , இரசாயன நீராவி படிவு , வளிமண்டலம் வேதியியல் ,