/PRNewswire/ The "Atomic Layer Deposition: R&D Portfolio Assessment and Growth Opportunities" report has been added to ResearchAndMarkets.com s offering..
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CVD (Chemical Vapor Deposition) is used to deposit materials in various forms, including monocrystalline, polycrystalline, amorphous, and epitaxial. By subtypes, there are mainly LPCVD (low pressure), PECVD (plasma enhanced), and ALD. PVD deposition techniques include sputtering and eBeam and thermal evaporation.
The CVD process involves mixing the source material with one or more volatile precursors using a plasma to chemically interact and breakdown the source material. The processes use heat with higher pressures leading to a more reproducible film where the film thicknesses could be managed by time/power. These films are more stoichiometric, they are denser and are capable of growing higher quality insulator films. The PVD processing uses a solid precursor metal that is gasified through some electrical energy. The gasified atoms are then transferred to the substrate. These processes manages thicknesses
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This report looks at the competitive challenges that OLED display technology faces from mini-LED and micro-LED over the next few years.
The key visual quality and performance qualities that we believe disruptors will continue to focus on include color gamut, power consumption, and display longevity. We believe mini-LED represents more of an evolution of existing LCD display technology in that a mini-LED array could serve as an alternative backlight source for the existing range of application, while the development progress in quantum dot (QD) emissive displays and microLED displays position those technologies to be potential disruptors in the premium display market segment over the next 2 to 5 years. In the meantime, we expect OLED displays as enabled by Universal Display will continue to be the premium display technology of choice in the mobile, smart watch, and TV markets for the foreseeable future.