Latest Breaking News On - ஜப்பான் சமூகம் க்கு தி ப்ரமோஶந் ஆஃப் அறிவியல் - Page 8 : comparemela.com

 E-Mail IMAGE: (top left) An illustration of the HiPIMS process (top right) The energy distribution of tungsten ions arriving at the substrate over time. At short times, there are a large proportion. view more  Credit: Tokyo Metropolitan University Tokyo, Japan - Researchers from Tokyo Metropolitan University have used high power impulse magnetron scattering (HiPIMS) to create thin films of tungsten with unprecedentedly low levels of film stress. By optimizing the timing of a substrate bias pulse with microsecond precision, they minimized impurities and defects to form crystalline films with stresses as low as 0.03 GPa, similar to those achieved through annealing. Their work promises efficient pathways for creating metallic films for the electronics industry.

Tetsuhide shimizuSwedish research council noUniversity faculty grantJapan society for the promotion of scienceTokyo metropolitan universityAssociate professor tetsuhide shimizuJoint international researchJapan societySwedish research councilSwedish government strategic research areaMaterials scienceFunctional materialsFaculty grantஜப்பான் சமூகம் க்கு தி ப்ரமோஶந் ஆஃப் அறிவியல்டோக்கியோ பெருநகர பல்கலைக்கழகம்கூட்டு சர்வதேச ஆராய்ச்சி