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Next-Gen Semiconductor Manufacturing Tech Wins DOE National Pitch Competition

UPTON, N.Y., Nov. 1, 2021 A process for making hybrid organic-inorganic materials (photoresists) sensitive to extreme-ultraviolet (EUV) light is one of

Yifan fangPriscilla antunezChang yong namPoorni upadhyaNikhil tiwalePoornima upadhyaBrookhaven labLawrence livermore national laboratoryTechnology commercialization fundNational labs accelerator pitch eventUs department of energyOffice of technology transitionsUc davis institute for innovationNational synchrotron light sourceOffice of science user facility at brookhavenNational security department

Next-Gen Semiconductor Manufacturing Tech Wins DOE National Pitch Competition

A process for making hybrid organic-inorganic materials (photoresists) sensitive to extreme-ultraviolet (EUV) light is one of two technologies that won the 2021

Yifan fangChang yong namNikhil tiwalePoornima upadhyaLawrence livermore national laboratoryTechnology commercialization fundNational labs accelerator pitch eventBrookhaven office of technologyUs department of energySandia national laboratoriesOffice of technology transitionsUc davis institute for innovationNational synchrotron light sourceElectronic nanomaterials groupStony brook universityBrookhaven lab office of technology

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