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TANAKA Establishes New Ruthenium Film Deposition Process

TANAKA Establishes New Ruthenium Film Deposition Process that Contributes toward Miniaturization and Improved Durability of Semiconductors

Chiyoda kuSouth koreaSoo hyun kimKikinzoku kogyoKoichiro tanakaCollege of engineeringYeungnam universitySchool of materials scienceDurability of semiconductorsNew ruthenium film depositionNew ruthenium film deposition processImproved durabilityRepresentative directorProfessor soo hyun kimMaterials scienceProfessor kim

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Chiyoda kuSouth koreaSoo hyun kimKikinzoku kogyoKoichiro tanakaCollege of engineeringSchool of materials scienceYeungnam universityDurability of semiconductorsKikinzoku kogyo liquid ruthenium precursorHoldings co ltdSemiconductor industryTanaka holdings co ltdNew ruthenium film deposition processImproved durabilityRepresentative director

acnnewswire.com - get the latest breaking news, showbiz & celebrity photos, sport news & rumours, viral videos and top stories from acnnewswire.com Daily Mail and Mail on Sunday newspapers.

Chiyoda kuSouth koreaSoo hyun kimKikinzoku kogyoKoichiro tanakaCollege of engineeringSchool of materials scienceYeungnam universityDurability of semiconductorsKikinzoku kogyo liquid ruthenium precursorHoldings co ltdSemiconductor industryTanaka holdings co ltdNew ruthenium film deposition processImproved durabilityRepresentative director

Business Scoop » TANAKA Establishes New Ruthenium Film Deposition Process That Contributes Toward Improved Durability Of Semiconductors

Business Scoop provides news and views on Business and Markets from New Zealand

Chiyoda kuSouth koreaSoo hyun kimKikinzoku kogyoKoichiro tanakaCollege of engineeringSemiconductor industryYeungnam universitySchool of materials scienceKikinzoku kogyo liquid ruthenium precursorPress releaseRepresentative directorProfessor soo hyun kimMaterials scienceProfessor kimLiquid ruthenium precursor

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