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New 4-Inch Plasma Etching Technology Opens Door to Mass Production of Next-Generation 2D Semiconductors

A large-scale (4-inch), highly uniform, and defect-free plasma etching technology, which will likely become the foundation of the industrial supply of molybdenum disulfide (MoS2), a next-generation two-dimensional (2D) semiconductor, has been developed.

South koreaMuyoung kimLaura thomsonjunChangmin kimTaesung kimMinistry of scienceSamsung electronicsSungkyunkwan universityDevelopment of core technology for semiconductorKorea institute of machineryHyeongu kimSenior researcherPlasma engineeringKorea institutePresident sang jin parkProfessor taesung kim

Large-scale plasma etching technology for mass production of next-generation 2D semiconductors

Large-scale plasma etching technology for mass production of next-generation 2D semiconductors
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South koreaTaesung kimChangmin kimMuyoung kimSungkyunkwan universitySamsung electronicsKorea institute of machineryKorea instituteHyeongu kimSenior researcherPlasma engineeringProfessor taesung kimResearcher hyeongu kim

The new alchemy in carbon neutrality: turning water into ammonia with only renewable energy!

The new alchemy in carbon neutrality: turning water into ammonia with only renewable energy!
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The new alchemy: Turning water into ammonia with only renewable energy!

The new alchemy: Turning water into ammonia with only renewable energy!
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South koreaFritz haberDae hoon leeKarl boschRoyal societyKorea institute of machineryEnergy lettersDepartment of plasma engineeringMinistry of scienceKorea institutePrincipal researcherPlasma engineeringArticle titleCatalyst integrated systemAmmonia productionதெற்கு கொரியா