Sponsored by Forge NanoFeb 17 2021
A pathway for ALD-enhanced materials to be quickly developed and transitioned from lab-scale to commercial production is available for almost any application, for the first time ever. Atomic-level surface engineering on porous materials and powders has not been viable at high throughputs, until now.
Image Credit: Shuttertstock/ Yuriy Vahlenko
A well-defined development pathway from R&D-scale (milligram to kilogram samples) to commercial-scale production (thousands of tons per year and beyond) is now facilitating the power of sub-nano surface coatings and bulk material property control.
Over the past sixty years, atomic layer deposition (ALD) has been employed to show surface property enhancement over hundreds of applications. Commercial ALD processes which rely on costly ultra-high purity precursors are available for wafer technologies in the semiconductor industry.