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Researchers hijack solar cell technology to develop a simple spray test for lead

Researchers hijack solar cell technology to develop a simple spray test for lead
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Painting With Semiconductors

Reading time ( words) AMOLF researchers Lukas Helmbrecht and Wim Noorduin have developed a reactive ink that can be painted on an equally reactive canvas. The ink reacts with the material on the canvas to become a semiconductor that emits colored light, an essential part of electronic components such as LEDs. Consequently, a new way of producing these electronic components is now within reach. The results of the research, a collaboration between the AMOLF groups Self-Organizing Matter and Hybrid Solar Cells, are published this week in the journal  Advanced Materials. Imagine that you could paint a canvas by making the canvas itself change to a different color instead of brushing paint on it. That is what Lukas Helmbrecht and his colleagues are doing with the new ion exchange lithography technique. In this technique, the ‘ink’ reacts with the ‘canvas’ by means of ion exchange. Helmbrecht put his money where his mouth is and used this technique to airbrush an image of Mad

Researchers paint portrait of Marie Curie in semiconductor

University of Amsterdam Amsterdam researchers have developed a novel technique for spatially controlled patterning of semiconductors with tuneable optoelectronic properties. As a proof of principle, Lukas Helmbrecht and Wim Noorduin ‘painted’ a portrait of Marie Curie in a perovskite semiconductor layer. Both researchers work at the AMOLF research institute at Amsterdam Science Park. Wim Noorduin is professor of Self-Organising Matter at the University of Amsterdam’s Van ‘t Hoff Institute for Molecular Sciences. Lukas Helmbrecht obtained his PhD at UvA under Noorduin’s supervision. The results of their research are published this week in the journal ‘Advanced Materials’. In the paper, Helmbrecht and Noorduin present their novel ion-exchange lithography technique that takes on the fundamental challenge of patterning semiconductor materials with different properties in a single film. This patterning is essential for the development of next‐generation (opto)electronic

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