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Chiyoda kuSouth koreaSoo hyun kimKikinzoku kogyoKoichiro tanakaCollege of engineeringSchool of materials scienceYeungnam universityDurability of semiconductorsKikinzoku kogyo liquid ruthenium precursorHoldings co ltdSemiconductor industryTanaka holdings co ltdNew ruthenium film deposition processImproved durabilityRepresentative director

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Business Scoop » TANAKA Establishes New Ruthenium Film Deposition Process That Contributes Toward Improved Durability Of Semiconductors

Business Scoop provides news and views on Business and Markets from New Zealand

Chiyoda kuSouth koreaSoo hyun kimKikinzoku kogyoKoichiro tanakaCollege of engineeringSemiconductor industryYeungnam universitySchool of materials scienceKikinzoku kogyo liquid ruthenium precursorPress releaseRepresentative directorProfessor soo hyun kimMaterials scienceProfessor kimLiquid ruthenium precursor

TANAKA Establishes New Ruthenium Film Deposition Process that Contributes toward Miniaturization and Improved Durability of Semiconductors

Prevents oxidation of substrates and achieves ultra-thin films of high quality and low resistance through a two-stage ALD process using the liquid ruthenium precursor "TRuST"; applications are expected

Chiyoda kuSouth koreaKostenloser wertpapierhandelSoo hyun kimKikinzoku kogyoKoichiro tanakaHoldings co ltdCollege of engineeringSemiconductor industryTanaka holdings co ltdSchool of materials scienceYeungnam universityKikinzoku kogyo liquid ruthenium precursorRepresentative directorProfessor soo hyun kimMaterials science

TANAKA Establishes New Ruthenium Film Deposition Process

TANAKA Establishes New Ruthenium Film Deposition Process
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South koreaSoo hyun kimKikinzoku kogyoCollege of engineeringYeungnam universitySchool of materials scienceKikinzoku kogyo liquid ruthenium precursorProfessor soo hyun kimMaterials scienceProfessor kimLiquid ruthenium precursor