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Vinnova supports AlixLabs AB for feasibility study within the new electronic components and systems program in areas of Swedish excellence

/PRNewswire/ AlixLabs from Lund, Sweden, has been rewarded financial support from Vinnova, Sweden s innovation agency, for further development of the.

United statesJonas sundqvistPrnewswire alixlabsRamin karimiDmitry suyatinUs patent officeLayer etch pitch splittingElectronic componentsOperational managerAtomic layer etch processesImmersion deepAtomic layer etch pitch splittingAtomic layer etchingAlixlabs ab

AlixLabs AB demonstrates pitch splitting in bulk silicon for leading edge semiconductor manufacturing

/PRNewswire/ AlixLabs from Lund, Sweden, demonstrates pitch splitting in bulk silicon using their proprietary patterning technology for semiconductor device.

Jonas sundqvistPrnewswire alixlabsUs patent officeLayer etch pitch splittingAspect ratioAtomic layer etch pitch splittingAtomic layer etchingAlixlabs ab

AlixLabs AB demonstrates pitch splitting in bulk silicon for leading edge semiconductor manufacturing

/PRNewswire/ AlixLabs from Lund, Sweden, demonstrates pitch splitting in bulk silicon using their proprietary patterning technology for semiconductor device.

Jonas sundqvistPrnewswire alixlabsUs patent officeLayer etch pitch splittingAspect ratioAtomic layer etch pitch splittingAtomic layer etching

AlixLabs AB demonstrates pitch splitting in bulk silicon for leading edge semiconductor manufacturing

AlixLabs AB demonstrates pitch splitting in bulk silicon for leading edge semiconductor manufacturing
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United statesJonas sundqvistPrnewswire alixlabsDmitry suyatinUs patent officeLayer etch pitch splittingAspect ratioAtomic layer etch processesAtomic layer etch pitch splittingAtomic layer etching

AlixLabs AB demonstrates pitch splitting in bulk silicon for leading edge semiconductor manufacturing

/PRNewswire/ AlixLabs from Lund, Sweden, demonstrates pitch splitting in bulk silicon using their proprietary patterning technology for semiconductor device.

Jonas sundqvistPrnewswire alixlabsUs patent officeLayer etch pitch splittingAspect ratioAtomic layer etch pitch splittingAtomic layer etching

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