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Intel s Next-Gen 14A Process Node Delivers 15% Higher Performance Per Watt Vs 18A, 14A-E Adds Another 5% Boost

Intel revealed more details on its next-gen 14A & 14A-E process nodes which deliver substantial performance & efficiency uplifts over 18A.

ASML reaches first light milestone on first High NA EUV tool, ET Telecom

The first High NA tool in existence is at ASML s laboratory in Veldhoven, Netherlands and the second is under assembly at an Intel plant near Hillsboro, Oregon.

ASML reaches first light milestone on first High NA EUV tool, Telcos, Media & Tech

ASML reaches first light milestone on first High NA EUV tool, Telcos, Media & Tech
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ASML reaches first light milestone on first High NA EUV tool

ASML has reached first light on its massive new High NA EUV lithography system, the Dutch semiconductor equipment maker confirmed on Wednesday, a milestone that means the tool is functioning. -February 28, 2024 at 06:26 am EST - MarketScreener

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