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Development of 3kV-Class Gallium Oxide Epitaxial Layer and Device Technologies : comparemela.com
Development of 3kV-Class Gallium Oxide Epitaxial Layer and Device Technologies
Electronics and Telecommunications Research Institute (ETRI) of Korea and its research team have successfully developed core material and device process technol
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Mun Jae Kyoung
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Jeon Dae Woo
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