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Business.Scoop » TANAKA Establishes New Ruthenium Film Deposition Process That Contributes Toward Improved Durability Of Semiconductors

Business Scoop provides news and views on Business and Markets from New Zealand ....

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TANAKA Establishes New Ruthenium Film Deposition Process that Contributes toward Miniaturization and Improved Durability of Semiconductors

Prevents oxidation of substrates and achieves ultra-thin films of high quality and low resistance through a two-stage ALD process using the liquid ruthenium precursor "TRuST"; applications are expected ....

Chiyoda Ku , South Korea , Kostenloser Wertpapierhandel , Soo Hyun Kim , Kikinzoku Kogyo , Koichiro Tanaka , Holdings Co Ltd , College Of Engineering , Semiconductor Industry , Tanaka Holdings Co Ltd , School Of Materials Science , Yeungnam University , Kikinzoku Kogyo Liquid Ruthenium Precursor , Representative Director , Professor Soo Hyun Kim , Materials Science , Professor Kim , Liquid Ruthenium Precursor ,

TANAKA Establishes New Ruthenium Film Deposition Process

TANAKA Establishes New Ruthenium Film Deposition Process
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